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Customizable Circular Dot Calibration Board With Chromium Coating

Dongguan Dafan Optical Technology Co., Ltd.
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    Buy cheap Customizable Circular Dot Calibration Board With Chromium Coating from wholesalers
     
    Buy cheap Customizable Circular Dot Calibration Board With Chromium Coating from wholesalers
    • Buy cheap Customizable Circular Dot Calibration Board With Chromium Coating from wholesalers

    Customizable Circular Dot Calibration Board With Chromium Coating

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    Model Number : DF-GR400-7.5
    Payment Terms : T/T
    Supply Ability : The average monthly production capacity for calibration plates and film is 300,000 pieces
    Certification : ISO9001
    Delivery Time : 5 Work Days
    Brand Name : DFOPTIX
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    Customizable Circular Dot Calibration Board With Chromium Coating

    Circular Dot Calibration Board


    The dot calibration grid is one of the most commonly used high-precision calibration tools in machine vision, industrial measurement, and computer vision (on par with the checkerboard calibration grid). It consists of an array of circular black and white dots, typically categorized as symmetrical or asymmetrical dot arrays.

    1. Core Advantages and Features

    (1) Extremely high sub-pixel accuracy: Dots possess natural geometric symmetry. By fitting the boundary of the entire circle or calculating the centroid, the algorithm can aggregate information from hundreds or thousands of pixels to determine the center position, achieving a positioning accuracy generally superior to traditional corner points (such as checkerboard corner points).

    (2) Strong anti-distortion capability: Under conditions of wide viewing angles or severe lens distortion, feature extraction from dot arrays is more stable than from square corner points, reducing the likelihood of feature point drift or misidentification.

    (3) High orientation discrimination: The asymmetric circle grid, by introducing a unique asymmetry in dot arrangement, allows the algorithm to automatically determine the orientation of the calibration grid in a single image, avoiding calculation errors caused by orientation reversal.

    2. Main Application Scenarios

    (1) Camera-based distortion calibration: Used to accurately calculate the camera's focal length, optical center, and lens distortion coefficient before machine vision 3D reconstruction, binocular stereo vision, or monocular ranging.

    (2) Industrial high-precision measurement and photogrammetry: Commonly used in aerial photography, large workpiece 3D measurement, and automotive manufacturing, where high precision is required.

    (3) Robot eye-hand calibration: Used in conjunction with the end-effector camera to establish precise mathematical transformations between the camera coordinate system and the robot arm coordinate system.

    3. Customization Services (Parameters and materials can be customized; custom designs based on provided drawings are also available)

    The dot calibration plate substrate is optional. Different substrates (such as glass, ceramics, film, aluminum plates, etc.) can be customized according to different application scenarios, environments, and precision requirements.

    The following are some commonly used substrate parameter information:

    1. Glass substrate parameters:

    Design

    Substrate

    Manufacturing Process

    Photolithography

    Glass substrate

    Quartz glass (fused silica)/soda glass

    Minimum line width

    1µm / 0.55µm

    Transmittance rate(@550nm)

    >95%

    Feature accuracy

    ±1µm

    Coefficient of thermal expansion

    (20-200°C)

    <5.0×10⁻⁷/K

    Coating

    Yellow chromium, bright chromium

    , blue chromium (low reflectivity)

    Expansion ratio(20-200°C)

    0.00006% (0.6µm/°C of 1m)

    Reflectance

    < 13.4% @550nm

    Surface flatness

    <0.55µm (length<50mm)

    < 1.8% @650nm

    <2µm (length<100mm)

    < 2.67% @750nm

    <5µm (length>100mm)

    Coating accuracy

    120nm (±0.20nm)

    Surface roughness

    <0.025µm

    Optical density OD

    Yellow Chromium 3 (Blue 5)

    Thickness

    1mm,1.6mm,2.3mm,3mm(±0.2mm)(500*500*4.8)

    White background

    Minimum line width:10µm

    Minimum/maximum size

    Min: 2×2 mm

    White background thickness: 40 µ m

    (smooth white coating on the back)

    Max: 800×960mm (±0.1mm)

    Positive & negative shapes

    Positive: pattern opaque

    Negative: pattern translucent

    Appearance and shape

    Square

    2. Ceramic substrate parameters:

    Design

    Substrate

    Manufacturing Process

    Photolithography

    Type

    Matte chromium on matte ceramics

    Bright chrome on glossy ceramics

    Type

    Matte ceramic

    Glossy ceramic

    Ceramic substrate

    Zirconia / Alumina

    Minimum line width

    4µm

    2µm

    Thickness

    1mm (±0.1mm, common)

    2mm (common)

    3mm (±0.1mm)

    Feature accuracy

    ±2µm

    ±2µm

    Surface flatness

    <30µm (length<100mm)

    <60µm (length<200mm)

    Appearance accuracy

    ±0.05mm

    ±0.05mm

    Surface flatness

    MIN: 2×2mm (±0.1mm);

    MAX: 228×228mm (±0.1mm)

    Coating

    Chromium

    Chromium

    Surface roughness

    <0.2-0.7µm

    Light coating/matte coating

    Matte chromium coating

    Bright chrome coating

    Coefficient of thermal expansion

    (40-400°C)

    <6.7×10⁻⁶/K

    ReflectaCnce

    < 12.88% @550nm

    < 9.56% @550nm

    Unit weight

    ≥ 3.66 g/cm³

    < 10.62% @650nm

    < 1.89% @650nm

    < 12.23% @750nm

    < 11.168% @750nm

    Coating thickness

    100-120nm

    100-120nm

    Rockwell hardness

    ≥80 HRA

    Positive and negative shapes

    Positive film: opaque pattern,

    Negative film: transparent pattern

    Appearance and shape

    Laser cutting of any shape

    Square

    Ellipse

    Protective layer

    The thin film above the chromium layer

    makes the chromium pattern more durable

    Special shape

    Punch

    Chamfer

    Oblique angle

    3. Film substrate parameters:

    Design

    Film substrate

    Manufacturing Process

    Lithography

    (Film Lithography Machine)

    Application

    Used for transmission/backlight

    /functional testing

    Minimum line width

    10 µ m/30 µ m optional

    Coefficient of expansion

    Film shrinks when heated and expands when cooled

    Feature accuracy


    ±10µm

    10µm/°C of 1m

    When the relative temperature is constant,
    When the humidity changes by 1 ° C,
    A film with a length of 1m will change by 10 µ m (one ten thousandth)

    Coating

    Silver bromide

    Transmittance rate(400~700nm)

    >90% ultraviolet<(400~700nm)>infrared

    Coating thickness

    2µm

    Film substrate thickness

    0.18mm (±0.01mm)

    Optical density OD

    OD>4 when 100% black
    (OD value controllable in grayscale)

    Maximum size

    0.71×0.81m (±0.1mm)(minimum line width 10µm)

    1.68×3.5m (±0.1mm)(minimum line width 30µm)

    color

    Black grayscale,

    sine grayscale

    Appearance

    Laser cutting, straight edge cutting, and circular hole hollowing are available


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