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AprilGrid QR Code Calibration Board Micron level high precision Customizable Size

Dongguan Dafan Optical Technology Co., Ltd.
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    Buy cheap AprilGrid QR Code Calibration Board Micron level high precision Customizable Size from wholesalers
     
    Buy cheap AprilGrid QR Code Calibration Board Micron level high precision Customizable Size from wholesalers
    • Buy cheap AprilGrid QR Code Calibration Board Micron level high precision Customizable Size from wholesalers

    AprilGrid QR Code Calibration Board Micron level high precision Customizable Size

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    Certification : ISO9001
    Payment Terms : T/T
    Supply Ability : The average monthly production capacity for calibration plates and film is 300,000 pieces
    Delivery Time : 10 Work Days
    Brand Name : DFOPTIX
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    AprilGrid QR Code Calibration Board Micron level high precision Customizable Size

    QR Code Calibration Board


    The AprilGrid Calibration Board features the AprilTag grid pattern for accurate camera calibration, lens distortion correction, and parameter estimation. The included bracket ensures stable mounting, making it ideal for industrial and robotic applications with customizable sizes for both indoor and outdoor use.

    Product Features: Micron-level high precision, high contrast, non-reflective, clear and easy to identify, High precision (with a maximum accuracy of 1um),supports multi-format drawing customization

    Applicable scenarios: Machine vision calibration (security, film and television, medical, camera, drone camera, photography studio, scientific research instruments, and other equipment)

    Substrate: The substrate for the QR code calibration plate is optional, and different substrates (such as glass, ceramic, aluminum plate, etc.) can be customized according to different usage scenarios, environments, and accuracy requirements.

    1. Glass substrate parameters:

    Design

    Substrate

    Manufacturing Process

    Photolithography

    Glass substrate

    Quartz glass (fused silica)/soda glass

    Minimum line width

    1µm / 0.55µm

    Transmittance rate(@550nm)

    >95%

    Feature accuracy

    ±1µm

    Coefficient of thermal expansion

    (20-200°C)

    <5.0×10⁻⁷/K

    Coating

    Yellow chromium, bright chromium

    , blue chromium (low reflectivity)

    Expansion ratio(20-200°C)

    0.00006% (0.6µm/°C of 1m)

    Reflectance

    < 13.4% @550nm

    Surface flatness

    <0.55µm (length<50mm)

    < 1.8% @650nm

    <2µm (length<100mm)

    < 2.67% @750nm

    <5µm (length>100mm)

    Coating accuracy

    120nm (±0.20nm)

    Surface roughness

    <0.025µm

    Optical density OD

    Yellow Chromium 3 (Blue 5)

    Thickness

    1mm,1.6mm,2.3mm,3mm(±0.2mm)(500*500*4.8)

    White background

    Minimum line width:10µm

    Minimum/maximum size

    Min: 2×2 mm

    White background thickness: 40 µ m

    (smooth white coating on the back)

    Max: 800×960mm (±0.1mm)

    Positive & negative shapes

    Positive: pattern opaque

    Negative: pattern translucent

    Appearance and shape

    Square

    2. Ceramic substrate parameters:

    Design

    Substrate

    Manufacturing Process

    Photolithography

    Type

    Matte chromium on matte ceramics

    Bright chrome on glossy ceramics

    Type

    Matte ceramic

    Glossy ceramic

    Ceramic substrate

    Zirconia / Alumina

    Minimum line width

    4µm

    2µm

    Thickness

    1mm (±0.1mm, common)

    2mm (common)

    3mm (±0.1mm)

    Feature accuracy

    ±2µm

    ±2µm

    Surface flatness

    <30µm (length<100mm)

    <60µm (length<200mm)

    Appearance accuracy

    ±0.05mm

    ±0.05mm

    Surface flatness

    MIN: 2×2mm (±0.1mm);

    MAX: 228×228mm (±0.1mm)

    Coating

    Chromium

    Chromium

    Surface roughness

    <0.2-0.7µm

    Light coating/matte coating

    Matte chromium coating

    Bright chrome coating

    Coefficient of thermal expansion

    (40-400°C)

    <6.7×10⁻⁶/K

    ReflectaCnce

    < 12.88% @550nm

    < 9.56% @550nm

    Unit weight

    ≥ 3.66 g/cm³

    < 10.62% @650nm

    < 1.89% @650nm

    < 12.23% @750nm

    < 11.168% @750nm

    Coating thickness

    100-120nm

    100-120nm

    Rockwell hardness

    ≥80 HRA

    Positive and negative shapes

    Positive film: opaque pattern,

    Negative film: transparent pattern

    Appearance and shape

    Laser cutting of any shape

    Square

    Ellipse

    Protective layer

    The thin film above the chromium layer

    makes the chromium pattern more durable

    Special shape

    Punch

    Chamfer

    Oblique angle

    3. Film substrate parameters:

    Design

    Film substrate

    Manufacturing Process

    Lithography

    (Film Lithography Machine)

    Application

    Used for transmission/backlight

    /functional testing

    Minimum line width

    10 µ m/30 µ m optional

    Coefficient of expansion

    Film shrinks when heated and expands when cooled

    Feature accuracy


    ±10µm

    10µm/°C of 1m

    When the relative temperature is constant,
    When the humidity changes by 1 ° C,
    A film with a length of 1m will change by 10 µ m (one ten thousandth)

    Coating

    Silver bromide

    Transmittance rate(400~700nm)

    >90% ultraviolet<(400~700nm)>infrared

    Coating thickness

    2µm

    Film substrate thickness

    0.18mm (±0.01mm)

    Optical density OD

    OD>4 when 100% black
    (OD value controllable in grayscale)

    Maximum size

    0.71×0.81m (±0.1mm)(minimum line width 10µm)

    1.68×3.5m (±0.1mm)(minimum line width 30µm)

    color

    Black grayscale,

    sine grayscale

    Appearance

    Laser cutting, straight edge cutting, and circular hole hollowing are available


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